Tungsten (W) Sputtering Target Description
Tungsten (W) Sputtering Target is manufactured from
high-purity tungsten (W) using precision fabrication techniques to ensure
exceptional quality and performance. Designed for advanced sputtering
applications, this target exhibits excellent thermal stability and durability,
making it the ideal choice for thin film deposition, semiconductor
manufacturing, and industrial coating processes. Its robust physical properties
and customizable shapes ensure reliable performance even in the most demanding
high-power environments.
Tungsten (W) Sputtering Target Applications
· Semiconductor Manufacturing: Essential for integrated
circuit fabrication and microelectronic devices.
· Thin Film Deposition: Enables high-quality coatings for optical and
electronic components.
· Industrial Coatings: Provides durable and uniform layers for wear-resistant
and corrosion-protective applications.
· Research and Development: Widely used in material science studies and
experimental sputtering techniques.
Tungsten (W) Sputtering Target Packing
Our Tungsten (W) Sputtering Target is packaged with care to
maintain its high purity and structural integrity throughout storage and
transportation. Packaging options include vacuum-sealed discs or custom-made
configurations, ensuring safe delivery to our customers.
Frequently Asked Questions
Q: How is the purity of the tungsten sputtering target
maintained during manufacturing?
A: The tungsten is processed under controlled environments using high-purity
raw materials and precision fabrication techniques, ensuring a purity level of
≥99%.
Q: Can the shapes of the sputtering target be customized?
A: Yes, aside from standard discs, custom-made shapes are available to meet
specific application requirements.
Q: What sputtering method is recommended for this target?
A: The Tungsten (W) Sputtering Target is optimized for DC sputtering systems,
which are commonly used in industrial deposition processes.
Q: How does tungsten’s high melting point benefit sputtering
applications?
A: The exceptionally high melting point (3422°C) ensures that tungsten
maintains its integrity and performance during high-temperature sputtering
operations.
Q: What precautions should be taken when handling tungsten
sputtering targets?
A: It is recommended to handle the targets with clean gloves and store them in
a controlled environment to prevent contamination and physical damage.
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