Iron Aluminum (Fe/Al) Sputtering Target Description
Iron Aluminum (Fe/Al) Sputtering Target is engineered for
high-performance sputtering processes in various advanced applications. Made
with a stringent purity level of ≥99%, this target is available in disc shapes
or can be custom-made based on project requirements. Although some parameters
such as melting point and density are not specified, its design focuses on
delivering stable sputtering performance and high-quality thin film deposition.
The incorporation of indium and elastomer bonds ensures durability and reliable
performance even under rigorous processing conditions.
Iron Aluminum (Fe/Al) Sputtering Target Applications
· Thin Film Deposition: Ideal for coating applications in
microelectronics and displays.
· Sputtering Processes: Used in the fabrication of integrated circuits and
surface treatments.
· Semiconductor Manufacturing: Provides the necessary material consistency for
reliable semiconductor device production.
· Research and Development: Serves as a versatile material in R&D settings
for novel thin film applications.
Iron Aluminum (Fe/Al) Sputtering Target Packing
Our Iron Aluminum (Fe/Al) Sputtering Target is packaged with
care to ensure its integrity during storage and transportation. Custom
packaging options are available to meet specific customer requirements,
ensuring that the product remains uncontaminated and ready for immediate use
upon delivery.
Frequently Asked Questions
Q: What is a sputtering target?
A: A sputtering target is a material used in physical vapor deposition (PVD)
processes where energetic particles eject atoms from the target to form a thin
film on a substrate.
Q: In which industries are sputtering targets commonly used?
A: Sputtering targets are essential in industries like microelectronics,
semiconductor manufacturing, optics, and surface engineering for high-quality
thin film deposition.
Q: How is the Iron Aluminum (Fe/Al) Sputtering Target
manufactured?
A: This target is fabricated with a high purity (≥99%) Fe/Al composition and
can be produced in standard disc shapes or custom-made formats to ensure
optimal performance in sputtering applications.
Q: What customization options are available?
A: The product is available in discs or can be custom-made to match specific
size and shape requirements as per customer demand.
Q: How should the Iron Aluminum (Fe/Al) Sputtering Target be
stored?
A: It is recommended to store the target in a clean, dry environment, ideally
in its original packaging, to maintain its integrity and prevent contamination
prior to use.
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