Nickel Vanadium (Ni/V) Sputtering Target Description
The Nickel Vanadium (Ni/V) Sputtering Target is engineered
to deliver excellent performance in physical vapor deposition applications.
Manufactured with a focus on high purity (≥99%), this target is available in
disc forms or can be custom-made to meet specific fabrication requirements. Its
robust composition and the precision of its design make it a suitable choice
for producing uniform thin films across substrates in advanced microelectronic
and optical devices. The reliable performance of this sputtering target ensures
consistent deposition rates and high-quality film characteristics even in
challenging operating environments.
Nickel Vanadium (Ni/V) Sputtering Target Applications
· Microelectronic Device Fabrication: Ideal for depositing
thin films in semiconductor manufacturing.
· Optical Coatings: Used in the production of reflective and anti-reflective
coatings for lenses and mirrors.
· Display Technologies: Employed in the development of liquid crystal displays
(LCDs) and other flat panel displays.
· Solar Cells: Facilitates the deposition of conductive and barrier layers in
photovoltaic applications.
· Precision Industrial Coatings: Leveraged for high-performance coatings in
various industrial tools and components.
Nickel Vanadium (Ni/V) Sputtering Target Packing
Our Nickel Vanadium (Ni/V) Sputtering Targets are handled
with utmost care during storage and transport to maintain their pristine
condition. Products are packaged in clean, controlled environments to ensure
contamination-free shipping. Available packaging options include vacuum-sealed
bags for discs or custom-designed containers to meet specialized requirements.
Frequently Asked Questions
Q: What is a sputtering target?
A: A sputtering target is a high-purity material used in physical vapor
deposition (PVD) processes to deposit thin films onto substrates, essential for
semiconductor, optical, and coating applications.
Q: How is the Nickel Vanadium (Ni/V) Sputtering Target
manufactured?
A: It is manufactured under stringent quality controls using advanced
fabrication techniques to ensure high purity and consistency, with options for
custom shapes like discs or tailored formats.
Q: Can the target be customized for specific deposition
requirements?
A: Yes, our Nickel Vanadium (Ni/V) Sputtering Targets are available in
customized sizes and shapes to meet the unique demands of different industrial
applications.
Q: In which industries can this sputtering target be used?
A: It is widely used in semiconductor device fabrication, optical coating,
display technology production, solar cell manufacturing, and other precision
industrial applications.
Q: How is the quality of the sputtering target maintained
during shipping?
A: The targets are packaged in clean-room environments using vacuum-sealed or
custom-designed packaging to prevent contamination and ensure they arrive in
optimal condition.
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