Barium Titanate (BaTiO3) Sputtering Target Description
The Barium Titanate (BaTiO3) Sputtering Target is engineered
to meet the rigorous requirements of modern industrial processes. Manufactured
with state-of-the-art techniques, this target offers a consistent
microstructure and excellent surface uniformity, ensuring reliable performance
during sputtering deposition. Its inherent high dielectric constant makes it an
ideal choice for fabricating capacitors, sensors, and various electronic
devices. Furthermore, the customized shapes available allow for tailored solutions
to meet specific design and application needs.
Barium Titanate (BaTiO3) Sputtering Target Applications
· Electronics: Essential for fabricating capacitors,
sensors, and ferroelectric devices.
· Microelectromechanical Systems (MEMS): Provides reliable performance in
miniaturized components.
· Coating Technologies: Used in sputtering deposition for creating thin films
with superior electrical properties.
· Industrial Devices: Suitable for high-precision applications in actuators and
transducers.
· Research and Development: Ideal for prototyping new materials and device
structures in advanced laboratories.
Barium Titanate (BaTiO3) Sputtering Target Packing
Our Barium Titanate Sputtering Targets are carefully
packaged to maintain their integrity during storage and transit. Each target is
securely wrapped using anti-static and cushioning materials to prevent any
damage, ensuring that it reaches you in impeccable condition. Customized
packaging solutions are available to meet specific logistical and safety
requirements.
Frequently Asked Questions
Q: What industries typically use Barium Titanate sputtering
targets?
A: They are widely used in the electronics industry for making capacitors,
sensors, MEMS devices, and various thin-film applications.
Q: Which sputtering methods can be applied with this target?
A: This target is compatible with both RF and DC sputtering techniques.
Q: Can the shapes of the Barium Titanate targets be
customized?
A: Yes, in addition to standard discs, custom-made shapes are available to suit
specific application requirements.
Q: How does the purity level affect the performance of the
sputtering target?
A: A purity level of ≥99% ensures minimal impurities, which is crucial for
achieving superior dielectric properties and consistent sputtering performance.
Q: What precautions should be taken while handling the
sputtering targets?
A: It is recommended to handle them in a clean, anti-static environment and to
follow proper packaging guidelines to maintain material integrity during
storage and transportation.
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