Lanthanum Nickel Oxide (LaNiO3) Sputtering Target Description
The Lanthanum Nickel Oxide (LaNiO3) Sputtering Target offers
exceptional purity and performance, making it the ideal choice for precision
deposition in various high-tech applications. Manufactured to exacting standards,
this target is available in disc form or can be custom-made to meet specific
process requirements. Its advanced design supports optimal sputtering behavior,
delivering uniform and reliable thin films across a range of substrates.
Lanthanum Nickel Oxide (LaNiO3) Sputtering Target Applications
· Thin-film deposition for semiconductor devices and
photovoltaic cells.
· Surface coating applications in advanced electronic components.
· Microelectronics manufacturing requiring high-precision and high-purity
deposition.
· Research and development processes in materials science and nanotechnology.
Lanthanum Nickel Oxide (LaNiO3) Sputtering Target Packing
Our Lanthanum Nickel Oxide Sputtering Targets are packaged
in high-integrity, moisture-resistant, vacuum-sealed packaging to maintain
quality and performance during storage and transportation. Custom packaging
solutions are available upon request to meet specific logistical needs.
Frequently Asked Questions
Q: What is sputtering?
A: Sputtering is a physical vapor deposition process in which energetic
particles eject material from a target, creating a thin film on a substrate.
Q: What benefits does the Lanthanum Nickel Oxide target
offer?
A: It provides high purity and excellent performance for uniform film
deposition, ensuring improved adhesion and consistency across various
substrates.
Q: Which sputtering methods are compatible with this target?
A: This target is compatible with RF, RF-R, and DC sputtering systems, making
it versatile for multiple deposition applications.
Q: Can this target be customized in shape or size?
A: Yes, in addition to standard disc forms, the target can be custom-made to
suit specific application requirements.
Q: What industries typically use Lanthanum Nickel Oxide
sputtering targets?
A: They are commonly used in semiconductor manufacturing, photovoltaic cell
production, advanced electronics, and various research applications.
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