Lutetium Oxide (Lu2O3) Sputtering Target Description
The Lutetium Oxide (Lu2O3) Sputtering Target is engineered
using a rigorous manufacturing process to ensure high purity (≥99%) and
excellent thermal properties. Offered in standard disc form or custom-made
shapes, this target is designed to meet the demanding requirements of
sputtering deposition processes. Its impressive melting point of 2490℃ and
density of 9.42 g/cm³ enable it to perform reliably in high-temperature and
high-vacuum environments, making it an ideal choice for advanced technological
applications.
Lutetium Oxide (Lu2O3) Sputtering Target Applications
·
Sputtering Deposition: Perfect for thin film deposition in
microelectronics and advanced coatings.
·
Microelectronics: Essential for semiconductor manufacturing and
device fabrication.
·
Optical Coatings: Enhances the performance and durability of
optical components.
·
Advanced Materials Research: Suited for high-temperature and
high-vacuum experimental setups.
Lutetium Oxide (Lu2O3) Sputtering Target Packaging
The Lutetium Oxide (Lu2O3) Sputtering Target is packaged
with utmost care to ensure quality preservation during storage and transit.
Custom packaging options are available to meet specific customer requirements,
typically featuring robust, vacuum-sealed containers to prevent contamination
and ensure optimal handling.
Frequently Asked Questions
Q: What are the primary applications of the Lutetium Oxide
Sputtering Target?
A: This target is primarily used in sputtering deposition processes for
applications in microelectronics, optical coatings, and advanced material
research.
Q: What is the purity level of the Lutetium Oxide Sputtering
Target?
A: The target is produced with a purity of ≥99%, ensuring high performance in
precision applications.
Q: Can the target be custom-made in shapes other than discs?
A: Yes, in addition to standard discs, the target can be custom-made to meet
specialized design requirements.
Q: How does the high melting point of 2490℃ benefit
sputtering processes?
A: The high melting point ensures excellent thermal stability during high-power
sputtering operations, reducing substrate damage and maintaining consistent
film quality.
Q: What storage and packaging methods are recommended for
this product?
A: The target should be stored in a controlled, dry environment; it is typically
packaged in vacuum-sealed containers to protect against contamination during
shipment.
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