Neodymium Oxide (Nd2O3) Sputtering Target Description
The Neodymium Oxide (Nd₂O₃) Sputtering Target is
manufactured with a minimum purity of 99% and is designed for superior
performance in advanced industrial applications. Produced using
state-of-the-art fabrication techniques, this target offers reliable sputtering
characteristics through RF, RF-R, and DC methods. Its high melting point and
unique bonding options ensure excellent stability and durability, making it an
ideal choice for microelectronic device fabrication, thin film deposition, and
surface engineering processes.
Neodymium Oxide (Nd2O3) Sputtering Target Applications
· Integrated Circuits Fabrication: Enables the deposition of
high-quality Nd₂O₃ films in modern microelectronic circuits.
· Thin Film Coatings: Used extensively in the production of decorative,
protective, and optical coatings.
· Optical Devices: Suitable for manufacturing high-performance optical
components and laser systems.
· Scientific Research: Employed in advanced material research and experimental
sputtering setups.
Neodymium Oxide (Nd2O3) Sputtering Target Packing
Our Neodymium Oxide (Nd₂O₃) Sputtering Target is packaged
with utmost care to preserve its high purity and performance.
Vacuum-sealed packaging is available with customizable options to meet specific
customer and application requirements.
Frequently Asked Questions
Q: What sputtering methods are compatible with this target?
A: The target supports RF, RF-R, and DC sputtering processes.
Q: What are the primary applications of the Nd₂O₃ sputtering
target?
A: It is widely used in microelectronics, thin film coatings, optical devices,
and scientific research.
Q: How is the high purity of the target maintained?
A: Advanced fabrication processes and strict quality control measures ensure
the product maintains a purity level of ≥99%.
Q: Can the target be customized in shape and size?
A: Yes, the targets can be provided as discs or customized to meet specific
requirements.
Q: Why is a high melting point important for this sputtering
target?
A: The high melting point of 2233℃ ensures enhanced stability and durability
during high-temperature sputtering applications.
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