Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target Description
The Zinc Oxide with Gallium Oxide Sputtering Target is
engineered for high-performance thin film deposition applications. Manufactured
with advanced precision control, this target ensures a uniform composition and
exceptional stability during the sputtering process. Its unique blend of ZnO
and Ga₂O₃ provides enhanced optical and electronic properties, making it ideal
for semiconductor, optoelectronic, and sensor applications. The product is
tailored to meet the exacting demands of modern industrial and research
environments.
Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target Applications
·
Semiconductor Thin Film Deposition: Ideal for fabricating
high-quality thin films in semiconductor devices.
·
Optoelectronics: Suitable for coating applications in solar
cells, LEDs, and photodetectors.
·
Sensors: Utilized in the production of sensitive and reliable gas
or chemical sensors.
·
Research and Development: Supports advanced materials research
and prototype development.
·
Coating Technologies: Employed in various surface modification
processes for enhanced device performance.
Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target Packaging
Our Zinc Oxide with Gallium Oxide Sputtering Target is
carefully packaged to ensure product integrity and prevent contamination.
Products are typically vacuum-sealed and securely packed to maintain quality
during storage and transportation. Custom packaging solutions are available
upon request to meet specific customer requirements.
Frequently Asked Questions
Q: What is sputtering and how does this target work in the
process?
A: Sputtering is a physical vapor deposition process where energetic particles
are used to eject atoms from a target material. The particles then deposit on a
substrate, forming a thin film. This target’s uniform composition ensures
consistent thin film quality.
Q: What are the benefits of using a ZnO/Ga₂O₃ sputtering
target?
A: The ZnO/Ga₂O₃ sputtering target offers high purity and precise composition
control, leading to superior thin film deposition. Its unique properties
enhance optical and electronic performance, which is ideal for semiconductor
and optoelectronic applications.
Q: How is the purity (≥99%) maintained during manufacturing?
A: The manufacturing process employs advanced refining techniques and strict
quality control measures at every stage. Continuous monitoring and testing
ensure the purity and consistency of the ZnO/Ga₂O₃ composition.
Q: Can the shape and size of the sputtering target be
customized?
A: Yes, the target is available in disc shapes or can be custom-made according
to specific customer requirements, offering flexibility for different
sputtering system designs.
Q: What quality assurance measures are implemented for this
product?
A: Our production process adheres to rigorous quality standards, including
precision control, in-process inspections, and final product testing. These
measures ensure that every sputtering target meets the high-performance
criteria required by advanced industrial and research applications.
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