Silicon Carbide (SiC) Sputtering Target Description
The Silicon Carbide (SiC) Sputtering Target is engineered
for precision thin film deposition in advanced industrial applications.
Manufactured using state-of-the-art techniques, this target exhibits
exceptional thermal stability, high chemical inertness, and consistent
performance under RF plasma conditions. Its high purity and customizable shapes
make it ideal for challenging deposition processes where reliability and
uniformity are critical.
Silicon Carbide (SiC) Sputtering Target Applications
· Semiconductor Manufacturing: Utilized for the deposition
of protective and functional SiC films in microelectronic devices.
· Thin Film Coatings: Employed in depositing durable and high-performance
coatings for optics and electronics.
· MEMS Devices: Suitable for fabricating microelectromechanical systems that
require robust and stable thin films.
· Research & Development: Used in experimental setups for developing
next-generation materials and electronic components.
Silicon Carbide (SiC) Sputtering Target Packing
Our Silicon Carbide Sputtering Targets are packaged in
hermetically sealed, contamination-free containers to maintain their pristine
condition. Custom packaging options are available to suit specific order sizes
and logistics requirements.
Frequently Asked Questions
Q: What industries primarily use the Silicon Carbide
Sputtering Target?
A: It is widely used in semiconductor manufacturing, thin film coating
processes, and the development of MEMS devices, as well as in research and
development applications.
Q: What sputtering process is this target designed for?
A: The target is specifically designed for RF sputtering processes, ensuring
uniform and consistent deposition.
Q: Why is the high melting point of ~2730℃ important?
A: The high melting point ensures that the target can withstand intense thermal
environments during sputtering, maintaining performance and stability even
under extreme conditions.
Q: How customizable are the shapes of the sputtering
targets?
A: The targets can be manufactured as standard discs or in custom-made shapes
to meet specific equipment or application needs.
Q: What quality standards ensure the performance of these
targets?
A: Each target is produced with a purity of ≥99% and undergoes rigorous quality
control measures, ensuring reliable performance and consistency for advanced
industrial applications.
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