Tungsten Carbide (WC) Sputtering Target Description
The Tungsten Carbide (WC) Sputtering Target is a
high-performance material designed for advanced sputtering applications.
Manufactured with a high purity (≥99%) composition, it ensures excellent
performance under RF sputtering conditions. Its outstanding thermal stability
and wear resistance make it an ideal choice for critical applications in
semiconductors, surface coatings, and microelectronics. The target’s ability to
deliver uniform film deposition enhances the efficiency and longevity of the
sputtering process even in the most challenging environments.
Tungsten Carbide (WC) Sputtering Target Applications
· Sputtering Deposition: Provides uniform thin films for
integrated circuits and advanced electronics.
· Surface Coatings: Enhances wear resistance and thermal stability in
industrial tooling and machinery.
· Microelectronics: Critical for fabricating semiconductors and MEMS devices
with superior performance requirements.
· Research and Development: Ideal for experimental deposition processes and new
material innovation.
Tungsten Carbide (WC) Sputtering Target Packing
Our Tungsten Carbide (WC) Sputtering Targets are packaged
with utmost care to preserve their quality and integrity. Vacuum-sealed
packaging is available in standard formats with custom packaging options
available upon request to meet specific application and shipping requirements.
Frequently Asked Questions
Q: What is tungsten carbide used for in sputtering targets?
A: Tungsten carbide sputtering targets offer exceptional durability, high thermal
stability, and wear resistance, making them ideal for deposition processes in
semiconductor and coating industries.
Q: What type of sputtering is used with this target?
A: This target is specifically designed for RF sputtering, ensuring efficient
film deposition with uniform thickness.
Q: Can these targets be customized in size and shape?
A: Yes, the Tungsten Carbide (WC) Sputtering Targets are available in standard
disc shapes or can be custom-made to suit specific application requirements.
Q: What is the significance of the high purity (≥99%) of
this target?
A: High purity ensures minimal contamination, thereby delivering consistent
performance and high-quality film deposition in advanced applications.
Q: Are there specific storage and handling instructions for
these targets?
A: It is recommended to store the sputtering target in a controlled environment
and handle it with care to maintain its structural integrity and performance
over time.
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