Sodium Aluminum Fluoride (Na5Al3F14) Sputtering Target Description
The Sodium Aluminum Fluoride (Na5Al3F14) Sputtering Target
is engineered for advanced sputtering applications, providing high-performance
and exceptional stability. With a composition meticulously controlled to ensure
≥99% purity, it delivers optimal performance for depositing uniform thin films
in electronic and semiconductor manufacturing. Its customizable shapes,
available as standard discs or made-to-order, cater to specific application
requirements while maintaining excellent physical properties under demanding
conditions.
Sodium Aluminum Fluoride (Na5Al3F14) Sputtering Target Applications
· Electronics Manufacturing: Ideal for forming uniform thin
films in semiconductor devices and display panels.
· Surface Coating: Utilized in sputtering processes for protective and
functional coatings.
· Vacuum Deposition: Effective in producing high-quality precision coatings in
vacuum environments.
· Research and Development: Suitable for advanced material studies and
innovative coating techniques.
Sodium Aluminum Fluoride (Na5Al3F14) Sputtering Target Packing
Our Sodium Aluminum Fluoride Sputtering Targets are
carefully packaged to maintain their high quality and integrity during storage
and transportation. Packaging options include vacuum-sealed discs, with custom
packaging available to match specific customer requirements.
Frequently Asked Questions
Q: What benefit does a purity of ≥99% provide in this
sputtering target?
A: High purity ensures consistent film deposition, minimal contamination, and
reliable performance throughout the sputtering process.
Q: Can the shape of the sputtering target be customized?
A: Yes, the target is available as standard discs or can be custom-made to meet
specific design and application needs.
Q: Which industries are best suited for this sputtering
target?
A: It is ideal for electronics manufacturing, semiconductor device production,
display panel fabrication, and advanced material research.
Q: How does the melting point (~1020℃) impact the target’s
performance?
A: The high melting point provides excellent thermal stability, making the
target suitable for processes that operate at elevated temperatures.
Q: What packaging options are provided for this product?
A: The sputtering target is delivered in vacuum-sealed packaging and can be
customized in size according to customer requirements.
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