Calcium Sulfide (CaS) Sputtering Target Description
The Calcium Sulfide (CaS) Sputtering Target is manufactured
to stringent quality standards with a composition of pure CaS (≥99%). Designed
for precise and efficient sputtering deposition, this target ensures
consistency and stability in high-temperature processing environments. Its
robust properties and customizable shapes make it ideal for applications
ranging from electronic device fabrication to optical coatings and research in
advanced materials science.
Calcium Sulfide (CaS) Sputtering Target Applications
· Thin Film Deposition: Employed in the fabrication of
high-quality thin films for semiconductors and optoelectronic devices.
· Electronic Device Manufacturing: Utilized in sputtering processes to create
uniform layers in integrated circuits and sensors.
· Optical Coatings: Provides a reliable material for deposition techniques used
in the production of mirrors, lenses, and other optical components.
· Research and Development: Ideal for laboratories and industrial R&D
projects focusing on novel material applications and coatings.
Calcium Sulfide (CaS) Sputtering Target Packing
The Calcium Sulfide (CaS) Sputtering Target is securely
packaged to maintain its purity and performance. Protective packaging methods
include vacuum-sealed containers and custom packaging solutions tailored to
customer requirements. Standard packaging is available in sizes that can be
customized based on application and quantity needs.
Frequently Asked Questions
Q: What is a sputtering target?
A: A sputtering target is a solid material used in physical vapor deposition
(PVD) processes to deposit thin films onto substrates through a sputtering
mechanism.
Q: Which applications benefit most from using a CaS
sputtering target?
A: Applications in electronics, optical coatings, and advanced research
particularly benefit from the high purity and stable performance of CaS
sputtering targets.
Q: Are custom-made shapes available for this target?
A: Yes, the Calcium Sulfide (CaS) Sputtering Target is available as discs or
custom-made to meet specific customer requirements.
Q: How does the high melting point of CaS affect its
performance in sputtering processes?
A: The high melting point of 2525℃ ensures that the target maintains structural
integrity and performance during high-temperature sputtering processes.
Q: What measures are taken to ensure the purity and
consistency of the CaS sputtering target?
A: The target is produced under stringent quality control measures, ensuring a
purity of ≥99%, which guarantees consistent performance and reliability in
demanding applications.
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