Germanium Sulfide (GeS) Sputtering Target Description
The Germanium Sulfide (GeS) Sputtering Target is produced
with high purity GeS (≥99%) and precision engineering to meet the rigorous
demands of modern thin film deposition processes. Designed for the semiconductor
and electronic industries, this sputtering target provides consistent
performance with a melting point of 940℃ and a density of 4.08 g/cm³. Its
customizable shapes, available as discs or bespoke designs, ensure
compatibility with a wide range of deposition systems. This product is ideal
for applications requiring reliable and uniform film production under
high-temperature conditions.
Germanium Sulfide (GeS) Sputtering Target Applications
· Semiconductor Manufacturing: Essential for fabricating integrated
circuits and electronic components with precise thin film characteristics.
· Photovoltaic Devices: Used in the deposition process to produce
high-efficiency solar cells.
· Thin Film Deposition: Provides excellent uniformity in coatings for sensors,
optoelectronic devices, and protective layers.
· Surface Engineering: Enables advanced surface modifications for improved wear
resistance and functional coatings.
· Research and Development: Supports experimental and pilot production in
material science laboratories.
Germanium Sulfide (GeS) Sputtering Target Packing
Our Germanium Sulfide (GeS) Sputtering Targets are packaged
with care to ensure they maintain their integrity during transit and storage.
· Standard Packaging: Vacuum-sealed discs or custom-designed packaging based on
client requirements.
· Available in: Custom sizes as per specific customer specifications to ensure
optimal compatibility with deposition equipment.
Frequently Asked Questions
Q: What industries typically use germanium sulfide sputtering
targets?
A: They are primarily used in semiconductor manufacturing, photovoltaic device
production, and advanced thin film deposition applications in electronics and
surface engineering.
Q: How does the high purity (≥99%) of GeS affect its performance?
A: The high purity ensures consistent film deposition, minimizes contamination
during processing, and contributes to enhanced material performance in critical
applications.
Q: Can I request a custom shape for the sputtering target?
A: Yes, the product is available in discs or can be custom-made to fit specific
deposition system requirements.
Q: What factors should be considered when integrating the
GeS sputtering target into a deposition system?
A: Key considerations include the target’s melting point, density, and the
compatibility of the target shape with the deposition equipment’s design.
Q: Are there special handling or storage requirements for
the GeS sputtering target?
A: It is recommended to store the target in a clean, dry, and temperature-controlled
environment. Vacuum-sealed packaging helps maintain its high purity and
prevents contamination.
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