Bismuth Selenide (Bi2Se3) Sputtering Target Description
The Bismuth Selenide (Bi2Se3) Sputtering Target is
engineered for precision in advanced sputtering applications. Manufactured with
a purity of ≥99%, this target ensures uniform deposition and reliable performance
in RF sputtering systems. Its target design, available in both standard disc
form and customizable shapes, makes it suitable for various industrial
applications including semiconductor manufacturing, thermoelectrics, and
research on quantum materials. With a melting point of 710℃ and a density of
6.82 g/cm³, the target guarantees consistent performance and durability even
under demanding processing conditions.
Bismuth Selenide (Bi2Se3) Sputtering Target Applications
· Thin Film Deposition: Ideal for creating high-quality,
uniform coatings in semiconductor and optoelectronic devices.
· Thermoelectric Devices: Used in fabricating devices that convert temperature
differences into electrical energy.
· Quantum Material Research: Supports experimental applications in advanced
material science and nanotechnology.
· Surface Engineering: Provides precise deposition for functional coatings and
protective layers in various industrial tools.
Bismuth Selenide (Bi2Se3) Sputtering Target Packing
Our Bismuth Selenide Sputtering Targets are packaged with
utmost care to preserve their quality. They are secured in anti-static,
moisture-resistant packaging solutions, and typically shipped in vacuum-sealed
containers. Packaging configurations can be tailored to meet specific customer
requirements.
Frequently Asked Questions
Q: What are the primary applications of the Bismuth Selenide
(Bi2Se3) Sputtering Target?
A: It is primarily used for thin film deposition in semiconductor
manufacturing, thermoelectric devices, quantum material research, and surface
engineering.
Q: Which sputtering method is recommended for this target?
A: RF sputtering is recommended to achieve optimal performance with this
target.
Q: What is the purity level of this sputtering target?
A: The target is produced with a purity of ≥99%, ensuring high consistency in
deposition processes.
Q: Can the shape and size of the sputtering target be
customized?
A: Yes, the target is available in standard disc form or can be custom-made to
meet specific requirements.
Q: How do the Indium and Elastomer bonds benefit the
sputtering process?
A: These bonds enhance thermal and mechanical stability during sputtering,
ensuring efficient heat dissipation and consistent performance throughout the
process.
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