Calcium Zirconate (CaZrO3) Sputtering Target Description
The Calcium Zirconate (CaZrO3) Sputtering Target is
engineered for high-reliability performance in thin film deposition
technologies. Manufactured with a purity of ≥99%, this target provides
consistency and durability essential for semiconductor manufacturing and
industrial coatings. Its high melting point of 2345℃ and robust density of 5
g/cm³ ensure stable operation even in challenging, high-temperature
environments.
Calcium Zirconate (CaZrO3) Sputtering Target Applications
· Thin Film Deposition: Ideal for producing high-quality
films in semiconductor and electronic device fabrication.
· Surface Coatings: Provides durable coatings for enhanced performance in
industrial applications.
· Advanced Electronics: Utilized in microelectronic device manufacturing and research.
· Industrial Tools: Enhances wear resistance and longevity of coated
components.
· Research and Development: Suitable for experimental and innovative coating
processes.
Calcium Zirconate (CaZrO3) Sputtering Target Packing
Our Calcium Zirconate Sputtering Targets are carefully
packaged to ensure maximum protection during transportation and storage. They
are typically packed in moisture-resistant, static-free materials, with
packaging options customizable to fit specific application requirements.
Frequently Asked Questions
Q: What is the primary application of Calcium Zirconate
sputtering targets?
A: They are primarily used for thin film deposition in semiconductor
manufacturing and surface coating processes.
Q: How does the high melting point benefit the performance
of the sputtering target?
A: The high melting point of 2345℃ ensures stability and reliable performance
during high-temperature deposition processes, reducing the risk of thermal
degradation.
Q: Which industries commonly utilize Calcium Zirconate
sputtering targets?
A: These targets are widely used in semiconductor fabrication, electronic
device production, industrial coatings, and research applications.
Q: Can the shapes and sizes of the sputtering targets be
customized?
A: Yes, the Calcium Zirconate sputtering targets are available in discs or
custom-made configurations to meet specific application requirements.
Q: How does a purity of ≥99% influence the effectiveness of
the sputtering target?
A: A high purity level minimizes contamination, ensuring the deposition of
consistent and high-quality thin films, which is crucial for advanced
electronic and coating applications.
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