Planar Tungsten (W) Sputtering Target Description
The Planar Tungsten (W) Sputtering Target is manufactured
from ≥99% pure tungsten, tailored for high-end thin film deposition
applications. Its planar design and customizable sizes ensure optimal
compatibility with various sputtering systems, delivering uniform coatings and
excellent overall performance in critical industrial processes.
Planar Tungsten (W) Sputtering Target Applications
· Semiconductor Fabrication: Perfect for depositing tungsten
thin films in integrated circuit manufacturing.
· Optical Coatings: Widely used in the production of high-quality mirrors and
optical filters.
· Energy Industries: Applied in the coating of components for enhanced
durability and performance under high temperatures.
· Advanced Electronics: Provides excellent reliability for specialized
electronic devices and sensors.
Planar Tungsten (W) Sputtering Target Packing
Our Planar Tungsten Sputtering Targets are packaged in
moisture-resistant, high-integrity packaging to preserve product quality during
storage and transport. Options typically include sealed bags and secure boxes,
tailored to meet specific customer requirements.
Frequently Asked Questions
Q: What is a sputtering target?
A: A sputtering target is a solid material used in physical vapor deposition to
create thin films through the sputtering process.
Q: How pure is the tungsten used in this product?
A: The tungsten used in this product is ≥99% pure, ensuring reliable and
consistent performance.
Q: Can I request a custom shape or size for the sputtering target?
A: Yes, custom shapes and sizes are available to meet specific application
requirements.
Q: What industries typically use tungsten sputtering
targets?
A: Tungsten sputtering targets are commonly used in semiconductor
manufacturing, optical coating, and advanced electronics applications.
Q: How should the sputtering target be stored?
A: It is recommended to store the target in a clean, dry environment to prevent
contamination and maintain its high performance.
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