Praseodymium Nickel Oxide (PrNiO) Sputtering Target Description
The Praseodymium Nickel Oxide (PrNiO) Sputtering Target is
engineered for advanced thin-film deposition processes. Manufactured to the
highest purity standards (≥99%), this target is available in standard disc
shapes or can be custom-made to meet your specific application needs. Designed
for precision and uniformity, it is ideal for applications in semiconductor
fabrication, optical coatings, and research environments, ensuring both
performance and reliability.
Praseodymium Nickel Oxide (PrNiO) Sputtering Target Applications
· Thin-Film Deposition: Essential for semiconductor
manufacturing and precision coatings.
· Optical Coatings: Provides uniform deposition for high-quality optical
performance.
· Surface Modification: Used in advanced materials processing for improved
surface properties.
· Research & Development: Ideal for experimental setups and the development
of novel devices.
Praseodymium Nickel Oxide (PrNiO) Sputtering Target Packing
Our Praseodymium Nickel Oxide (PrNiO) Sputtering Target is
securely packaged to maintain quality during storage and transportation. Custom
packaging options are available to meet specific customer requirements.
Frequently Asked Questions
Q: What is the chemical composition of this sputtering
target?
A: The target is composed of Praseodymium Nickel Oxide (PrNiO).
Q: Can I request a custom shape for the target?
A: Yes, the target is available as discs or can be custom-made to suit your
application needs.
Q: What is the purity level of the sputtering target?
A: The target has a purity of ≥99%.
Q: Are the melting point and density parameters specified?
A: Currently, the melting point and density values are not available (N/A).
Q: How can I obtain further technical support or custom
specifications?
A: Please contact our technical support team for assistance with custom orders
or additional product information.
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