Iridium Manganese (Ir/Mn) Sputtering Target Description
The Iridium Manganese (Ir/Mn) Sputtering Target is
engineered for superior performance in sputtering processes. With a composition
of Ir/Mn and a purity of ≥99%, this target is available in standard disc shapes
or can be custom-made to meet specific application requirements. It is designed
to provide consistent, high-quality performance in applications that demand
reliability and precision.
Iridium Manganese (Ir/Mn) Sputtering Target Applications
· Semiconductor manufacturing for thin film deposition.
· Production of advanced coatings using sputtering techniques.
· Research and development in physical vapor deposition (PVD) processes.
· LED and display manufacturing for superior layer uniformity.
· Solar cell fabrication where controlled material properties are essential.
Iridium Manganese (Ir/Mn) Sputtering Target Packing
Our Iridium Manganese (Ir/Mn) Sputtering Target is packaged
with utmost care to preserve its integrity and quality. Packaging options
include secure, protective containers designed for safe transportation and
storage, customized to meet client-specific shipping requirements.
Frequently Asked Questions
Q: What industries commonly use Iridium Manganese Sputtering
Targets?
A: They are widely used in semiconductor manufacturing, advanced coating
processes, LED production, and solar cell fabrication.
Q: Can the target be custom-made to specific dimensions?
A: Yes, the target is available in custom-made shapes to meet unique
application needs.
Q: What is the purity level of this sputtering target?
A: The purity of the target is maintained at ≥99% to ensure high-performance
results.
Q: Is there a specified melting point for this product?
A: The melting point is listed as N/A, which indicates it is not a relevant
parameter for this sputtering target.
Q: What types of bond are used in this product?
A: The product features bonds made with Indium and Elastomer, ensuring reliable
performance in sputtering applications.