Platinum Ruthenium (Pt/Ru) Sputtering Target Description
The Platinum Ruthenium (Pt/Ru) Sputtering Target
manufactured by Stanford Advanced Materials is engineered for high performance
in modern deposition technologies. Utilizing state-of-the-art manufacturing
processes, this product offers excellent purity and customizable forms that
meet the demanding requirements of advanced industrial applications. Its
superior properties ensure reliable sputtering performance and uniform film
deposition, making it an ideal choice for research, development, and production
in high-tech industries.
Platinum Ruthenium (Pt/Ru) Sputtering Target Applications
· Microelectronics: Essential for depositing high-quality
thin films in integrated circuits and sensors.
· Flat Panel Displays: Provides uniform coatings crucial for advanced display
technology.
· Solar Cells: Used in the formation of electrodes for efficient thin-film
solar cells.
· Research and Development: Ideal for experimental setups in materials science
and nanotechnology.
Platinum Ruthenium (Pt/Ru) Sputtering Target Packing
Our Platinum Ruthenium (Pt/Ru) Sputtering Target is
carefully handled and packaged to maintain its exceptional quality. Individual
units are vacuum-sealed and packed in custom-made containers designed to meet
specific customer requirements, ensuring safe storage and transportation.
Frequently Asked Questions
Q: What are the main advantages of using a Pt/Ru sputtering
target?
A: The Pt/Ru sputtering target offers high purity and exceptional performance,
providing superior film adhesion, uniform deposition, and enhanced electrical
conductivity in various applications.
Q: Can the shape of the sputtering target be customized?
A: Yes, the Pt/Ru sputtering target is available in standard disc shapes or can
be custom-made to meet specific design and application needs.
Q: What industries commonly use the Pt/Ru sputtering target?
A: It is widely used in microelectronics, flat panel displays, solar cells, and
various research and development applications where precise thin-film
deposition is required.
Q: How does the bonding type affect the performance of the
sputtering target?
A: The use of Indium and Elastomer bonding ensures excellent thermal and
mechanical stability, which enhances the target’s performance during the
sputtering process.
Q: What quality standards are maintained in the production
of this sputtering target?
A: The product is manufactured under strict quality control measures, ensuring
a purity of ≥99% and adherence to industry standards for high-performance
sputtering targets.
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