Silicon Chromium (Si/Cr) Sputtering Target Description
The Silicon Chromium (Si/Cr) Sputtering Target is engineered
for superior performance in thin film deposition processes. Manufactured with a
purity of ≥99%, this target is designed to offer consistent and reliable
material output for semiconductor, photovoltaic, and optical coating
applications. Using advanced production technologies, the target provides
excellent uniformity and compositional stability that is crucial for high-end
industrial applications. Its customizable shape options and bonding types
ensure integration into a variety of deposition systems, enhancing overall
process efficiency and coating quality.
Silicon Chromium (Si/Cr) Sputtering Target Applications
· Semiconductor Fabrication: Ideal for depositing thin films
in microelectronic device manufacturing.
· Photovoltaic Cells: Used in the production of solar panels where uniform film
coatings are critical.
· Optical Coatings: Provides high performance for anti-reflective and
protective coating applications.
· Research & Development: Perfect for material science studies and
prototype development in deposition technology.
· Industrial Coatings: Employed in advanced coating systems for improved wear
resistance and durability.
Silicon Chromium (Si/Cr) Sputtering Target Packing
Our Silicon Chromium (Si/Cr) Sputtering Targets are securely
packaged to preserve material purity and integrity during transportation and
storage. The products are vacuum-sealed and cushioned within custom-designed
containers to prevent contamination and physical damage. Packaging options are
available in various sizes according to customer requirements.
Frequently Asked Questions
Q: What applications are most suitable for the Silicon
Chromium (Si/Cr) Sputtering Target?
A: It is most suitable for semiconductor fabrication, photovoltaic cell
production, optical coatings, and research applications requiring high purity
thin film deposition.
Q: How is the high purity (≥99%) maintained during the
manufacturing process?
A: High purity is achieved through rigorous quality control protocols and
advanced production techniques that minimize contamination at every stage of
production.
Q: Can this sputtering target be customized to fit specific
deposition systems?
A: Yes, our Silicon Chromium (Si/Cr) sputtering targets are available in
customized shapes and sizes to meet the specific design requirements of your
deposition system.
Q: What bonding options are available for these sputtering
targets?
A: The targets are available with Indium and Elastomer bonding, ensuring
compatibility with a variety of sputtering setups and enhancing thermal and
mechanical stability.
Q: How should the Silicon Chromium (Si/Cr) Sputtering Target
be stored?
A: It is recommended to store the targets in a cool, dry environment while keeping
them in their original vacuum-sealed packaging to maintain their purity and
performance.
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