Titanium Silicide (Ti5Si3) Sputtering Target Description
The Titanium Silicide (Ti5Si3) Sputtering Target is
manufactured using advanced techniques to achieve a purity level of ≥99%.
Designed for precision sputtering processes, it offers consistent deposition
performance and is available in discs or custom-made shapes to meet varied
industrial requirements. This target is ideal for applications in semiconductor
fabrication, thin film deposition, and other high-technology fields where
material performance is critical.
Titanium Silicide (Ti5Si3) Sputtering Target Applications
· Thin Film Deposition: Essential for semiconductor device
manufacturing and precise coating applications.
· Electronic Devices: Ideal for fabricating layers in microelectronic
components and sensors.
· Research and Development: Provides high consistency and repeatability for
experimental sputtering processes.
· Surface Coatings: Used to create advanced coatings with improved adhesion and
durability on various substrates.
Titanium Silicide (Ti5Si3) Sputtering Target Packaging
Our Titanium Silicide (Ti5Si3) Sputtering Target is securely
packaged to maintain its high purity and performance characteristics. Packaging
options are customized to ensure safe transportation and storage according to
client specifications.
Frequently Asked Questions
Q: What industries commonly use Titanium Silicide sputtering
targets?
A: They are widely used in the semiconductor, electronics, and research
industries for thin film deposition and surface coating applications.
Q: How does a purity level of ≥99% benefit sputtering
processes?
A: High purity ensures consistent film quality, improved electrical
characteristics, and enhanced reliability in the final product.
Q: Can the target be supplied in custom shapes and sizes?
A: Yes, the Titanium Silicide Sputtering Target is available in discs or
custom-made shapes to meet specific user requirements.
Q: What deposition methods are ideal for using this target?
A: It is optimized for sputtering techniques and is compatible with standard
sputtering equipment.
Q: How should the sputtering target be stored?
A: It should be stored in a controlled environment, free from moisture and
contaminants, to maintain its purity and performance.
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