Tantalum doped Lithium Lanthanum Zirconate Sputtering Target Description
The Tantalum doped Lithium Lanthanum Zirconate Sputtering
Target is developed using advanced material processing techniques to ensure
exceptional purity and consistency. The Ta-doped LLZO formulation offers enhanced
ionic conductivity and excellent stability, making it an ideal candidate for
precise thin film deposition. Its tailored design provides uniform performance
under rigorous sputtering conditions, promoting superior film adhesion and
microstructural control. This target is especially suited for fabricating
high-quality components in microelectronics, energy storage devices, and other
cutting-edge applications.
Tantalum doped Lithium Lanthanum Zirconate Sputtering Target Applications
· Thin Film Deposition: Ideal for creating uniform,
high-quality films in semiconductor and microelectronic manufacturing.
· Solid-State Batteries: Utilized in the production of solid electrolytes for
high-performance battery technologies.
· Advanced Coatings: Employed in coating applications that demand excellent
chemical stability and film integrity.
· Research and Development: A valuable material for experimental studies in
material science and nanotechnology.
Tantalum doped Lithium Lanthanum Zirconate Sputtering Target Packing
Our sputtering targets are carefully packaged to ensure
product integrity during storage and transportation. Each order is
custom-packed to meet customer specifications, with options for vacuum-sealed
packaging to maintain purity and performance.
Frequently Asked Questions
Q: What makes Ta-doped LLZO different from standard LLZO?
A: The addition of tantalum improves the ionic conductivity and enhances the
stability of the base material, making it particularly well-suited for
demanding thin film deposition and solid-state battery applications.
Q: In which applications can this sputtering target be used?
A: It is ideal for thin film deposition in semiconductor manufacturing, solid
electrolyte formation in batteries, advanced coating applications, and
research-based material innovations.
Q: Are custom shapes available for this sputtering target?
A: Yes, the product is available in standard disc form or can be custom-made to
specific dimensions as required by your application.
Q: How does the purity level of ≥99% impact performance?
A: A high purity level minimizes impurities that could interfere with the
sputtering process, ensuring consistent film quality and better performance in
sensitive electronics and energy storage devices.
Q: What are the recommended storage and handling procedures?
A: It is recommended to store the sputtering target in a clean, dry environment
and utilize vacuum-sealed or similarly protective packaging during
transportation to prevent contamination.
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