ST0933 알루미늄 셀레나이드 스퍼터링 타겟, Al2Se3

Aluminum Selenide Sputtering Target Description

The Aluminum Selenide Sputtering Target, Al2Se3 is engineered for superior performance in sputtering deposition processes. Manufactured with a purity of ≥99% and available in discs or custom-made shapes, this target ensures reliable, high-quality film deposition in semiconductor and advanced coating applications. With a melting point of 1000 °C and a density of 3.43 g/cm³, the product is designed to withstand high-temperature industrial processes while offering excellent stability. The indium bonding enhances thermal and mechanical support during sputtering, making it an ideal choice for precision applications.

Aluminum Selenide Sputtering Target Applications

· Semiconductor Deposition: Ideal for applying uniform thin films in microelectronics.
· Advanced Coatings: Excellent for optical coatings, wear-resistant layers, and protective films.
· Materials Research: Used in experimental setups for novel material investigations.
· Industrial Fabrication: Supports high-temperature processes in various fabrication environments.
· Custom Industrial Solutions: Adaptable for specific industrial requirements with customized sizes and shapes.

Aluminum Selenide Sputtering Target Packing

Our Aluminum Selenide Sputtering Targets are packaged with utmost care to maintain product integrity during transportation and storage. Standard packaging includes vacuum-sealed packs, and we offer custom packing solutions to meet specific delivery requirements and quantities.

Frequently Asked Questions

Q: What makes Aluminum Selenide suitable for sputtering applications?
A: Aluminum Selenide possesses unique material properties such as high purity and thermal stability, which are critical for achieving uniform thin films in sputtering processes.

Q: What shapes are available for the sputtering target?
A: The target is available in standard disc shapes or can be custom-made to meet specific application needs.

Q: How does the indium bond contribute to the performance of the target?
A: The indium bond provides enhanced thermal and mechanical support during the sputtering process, ensuring stable performance under rigorous conditions.

Q: Can this sputtering target withstand high-temperature applications?
A: Yes, with a melting point of 1000 °C, this aluminum selenide target is well-suited for high-temperature industrial and research applications.

Q: How can I order a customized size for my application?
A: Simply contact our sales team with your specifications, and we will provide customized solutions tailored to your requirements.