Aluminum Selenide Sputtering Target Description
The Aluminum Selenide Sputtering Target, Al2Se3 is
engineered for superior performance in sputtering deposition processes.
Manufactured with a purity of ≥99% and available in discs or custom-made
shapes, this target ensures reliable, high-quality film deposition in semiconductor
and advanced coating applications. With a melting point of 1000 °C and a
density of 3.43 g/cm³, the product is designed to withstand high-temperature
industrial processes while offering excellent stability. The indium bonding
enhances thermal and mechanical support during sputtering, making it an ideal
choice for precision applications.
Aluminum Selenide Sputtering Target Applications
· Semiconductor Deposition: Ideal for applying uniform thin
films in microelectronics.
· Advanced Coatings: Excellent for optical coatings, wear-resistant layers, and
protective films.
· Materials Research: Used in experimental setups for novel material
investigations.
· Industrial Fabrication: Supports high-temperature processes in various
fabrication environments.
· Custom Industrial Solutions: Adaptable for specific industrial requirements
with customized sizes and shapes.
Aluminum Selenide Sputtering Target Packing
Our Aluminum Selenide Sputtering Targets are packaged with
utmost care to maintain product integrity during transportation and storage.
Standard packaging includes vacuum-sealed packs, and we offer custom packing
solutions to meet specific delivery requirements and quantities.
Frequently Asked Questions
Q: What makes Aluminum Selenide suitable for sputtering
applications?
A: Aluminum Selenide possesses unique material properties such as high purity
and thermal stability, which are critical for achieving uniform thin films in
sputtering processes.
Q: What shapes are available for the sputtering target?
A: The target is available in standard disc shapes or can be custom-made to
meet specific application needs.
Q: How does the indium bond contribute to the performance of
the target?
A: The indium bond provides enhanced thermal and mechanical support during the
sputtering process, ensuring stable performance under rigorous conditions.
Q: Can this sputtering target withstand high-temperature
applications?
A: Yes, with a melting point of 1000 °C, this aluminum selenide target is
well-suited for high-temperature industrial and research applications.
Q: How can I order a customized size for my application?
A: Simply contact our sales team with your specifications, and we will provide
customized solutions tailored to your requirements.
글쓰기
변환기 및 계산기
