Manganese-Iron Oxide Sputtering Target Description
The Manganese-Iron Oxide Sputtering Target, MnFe2O4 is
engineered with high purity (≥99%) and is available in customizable shapes
including discs or custom-made forms. Designed for precision in sputtering
applications, it offers stable performance even at elevated temperatures
(>300 °C) and proves to be a robust solution for various industrial coating
and electronic fabrication processes.
Manganese-Iron Oxide Sputtering Target Applications
· Semiconductor Manufacturing: Used for thin-film deposition
in integrated circuits and display technologies.
· Coating Processes: Ideal for surface coating applications requiring high
durability and chemical stability.
· Advanced Electronics: Suitable for formulations needing high purity and
precise deposition.
· Research and Development: Employed in experimental setups for developing new
materials and sputtering processes.
Manganese-Iron Oxide Sputtering Target Packing
Our Manganese-Iron Oxide Sputtering Targets are securely
packaged to maintain optimum condition during storage and transportation.
Packaging options include protective packaging for discs as well as customized
solutions according to customer requirements.
Frequently Asked Questions
Q: What are sputtering targets used for?
A: Sputtering targets are used in the physical vapor deposition process to
create thin films on substrates for applications such as semiconductors,
displays, and coatings.
Q: How is the purity of the sputtering target verified?
A: The purity is verified using advanced analytical methods such as mass
spectrometry and X-ray fluorescence to ensure it meets the stringent standards
required.
Q: Can the shapes of the sputtering targets be customized?
A: Yes, the sputtering targets can be custom-made, offering the flexibility to
meet specific design and functional requirements.
Q: What operating temperature can this sputtering target
withstand?
A: This product is designed to operate at temperatures above 300 °C, ensuring
stable performance in high-temperature applications.
Q: How does this product differ from other sputtering
targets?
A: Our product offers superior purity and performance, making it an ideal
choice for advanced industrial applications, research and development, and
precise coating processes.
글쓰기
변환기 및 계산기
