Strontium Iron Oxide Sputtering Target Description
The Strontium Iron Oxide Sputtering Target, SrFe12O19 is
engineered to meet the high standards required for modern sputtering
applications. Crafted with exceptional purity (≥99%), this target ensures
consistent performance and reliable operation in processes such as thin film
deposition. Its high melting point of 450 °C and density of 8.02 g/cm³
contribute to its suitability in environments demanding precise thermal
management and structural integrity. Designed for versatility, the target is available
as standard discs or can be customized to unique customer specifications,
ensuring optimal compatibility with various sputtering systems.
Strontium Iron Oxide Sputtering Target Applications
· Thin Film Deposition: Ideal for creating uniform metallic,
magnetic, or insulating thin films in semiconductor and microelectronic
processes.
· Microelectronics: Used in the fabrication of integrated circuits where
precision and reliability are critical.
· Optoelectronic Devices: Supports the development of displays, sensors, and
photovoltaic cells by providing consistent material properties.
· Research & Development: Suitable for experimental sputtering applications
where material performance and reproducibility are essential.
Strontium Iron Oxide Sputtering Target Packing
The sputtering targets are securely packaged to preserve
their quality and integrity during storage and transit. Standard packaging
includes protective containers designed to minimize contamination and
mechanical damage. Customized packaging solutions are also available to meet
specific customer requirements.
Frequently Asked Questions
Q: What is the exact composition of the sputtering target?
A: The composition is SrFe₁₂O₁₉.
Q: What shapes are available for this product?
A: The product is available in discs or can be custom-made to meet specific
requirements.
Q: What is the purity level of the sputtering target?
A: The purity is maintained at ≥99%.
Q: What does the melting point of 450 °C imply for its
applications?
A: The melting point indicates excellent thermal stability, making it ideal for
high-temperature sputtering processes.
Q: How is the sputtering target packaged?
A: The targets are packaged in secure, protective containers, with customized
packaging options available as per customer needs.
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