Niobium-doped Titanium Dioxide Sputtering Target Description
The Niobium-doped Titanium Dioxide Sputtering Target,
TiO2-Nb is engineered for superior film deposition across various high-tech
applications. Utilizing advanced manufacturing techniques, this target ensures
uniformity, stability, and excellent performance under demanding conditions.
Its high purity (≥99%) and customizable shapes make it an ideal choice for
critical processes in semiconductor fabrication, solar cell production, and
optoelectronic device manufacturing.
Niobium-doped Titanium Dioxide Sputtering Target Applications
· Semiconductor Manufacturing: Provides excellent thin-film
deposition for integrated circuits and microelectronic devices.
· Photovoltaics: Enhances the production efficiency and performance of solar
cells.
· Optoelectronics: Ideal for the fabrication of optical coatings and display
technologies.
· Research & Development: Suitable for experimental setups requiring high
purity and stability.
Niobium-doped Titanium Dioxide Sputtering Target Packing
Our sputtering targets are carefully packaged to preserve
their quality and integrity during transport. Each target is secured in
anti-static, protective packaging to prevent any damage, ensuring that the
material arrives in optimal condition for application.
Frequently Asked Questions
Q: What are the benefits of niobium doping in the TiO2
sputtering target?
A: Niobium doping enhances the electrical and physical properties of TiO2,
resulting in improved film uniformity and stability during the deposition
process.
Q: How does the high purity (≥99%) of this target affect its
performance?
A: The high purity ensures minimal contamination during film deposition, which
is critical for achieving precise and reliable thin-film characteristics in
demanding applications.
Q: What types of applications can utilize this sputtering
target?
A: This target is ideal for semiconductor manufacturing, photovoltaic cells,
optoelectronic devices, and research applications requiring high-quality thin
films.
Q: Can the shape of the sputtering target be customized?
A: Yes, the targets are available in discs or can be custom-made to meet
specific design and performance requirements.
Q: What considerations should be taken during the storage
and handling of the sputtering targets?
A: It is recommended to store the targets in a controlled environment using
anti-static and protective packaging to prevent mechanical or electrostatic
damage before they are deployed in the deposition process.
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