Barium Carbonate Sputtering Target Description
The Barium Carbonate Sputtering Target, BaCO3 is designed
for precision thin film deposition in high-tech industrial applications.
Manufactured to a purity of ≥99%, it provides excellent consistency and
performance during the sputtering process. With a melting point of 811°C and a
density of 3.89 g/cm³, this target offers superior thermal stability and
material integrity. Available in standard disc shapes or custom-made
configurations, it is ideal for applications requiring tailored sputtering target
sizes and specifications.
Barium Carbonate Sputtering Target Applications
· Microelectronics: Used for depositing high-quality
dielectric and functional coatings in semiconductor devices.
· Optical Coatings: Ensures precise and uniform film formation for displays and
optical components.
· Thin Film Deposition: Ideal for sputtering processes in various advanced
coating applications.
· Industrial Coatings: Suitable for protective and decorative coatings in
high-performance industrial tools and equipment.
Barium Carbonate Sputtering Target Packing
Our Barium Carbonate Sputtering Target is carefully packaged
to maintain its high purity and structural integrity throughout transportation
and storage. Packaging options are available in vacuum-sealed formats, with
customized sizes to meet specific production requirements.
Frequently Asked Questions
Q: What is the main application of the Barium Carbonate
Sputtering Target, BaCO3?
A: It is primarily used for thin film deposition in sectors such as
semiconductor, display, and microelectronics, ensuring high-quality coatings.
Q: What is the purity level of this sputtering target?
A: The product is manufactured with a purity of ≥99%, ensuring consistent
performance during sputtering processes.
Q: Can the shape of the sputtering target be customized?
A: Yes, the target is available as standard discs or can be custom-made to suit
specific application and equipment requirements.
Q: How does the melting point of 811°C affect the product's
performance?
A: The high melting point of 811°C ensures excellent thermal stability during
the sputtering process, contributing to reliable and uniform film deposition.
Q: Which industries benefit most from using this sputtering
target?
A: Industries such as semiconductor manufacturing, optical display production,
and microelectronics extensively benefit from its high purity and precise
sputtering performance.
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